Garment detail 

The below-knee length dress has cap sleeves and a gently rising neckline that echoes the appliquéd motifs of the jacket. It is created by bias-applying a self-fabric panel that is notched at its center in a rounded V. Narrow bias bands cover the seams at the yoke and waist. The skirt is slightly flared and shirred at the waist. It has small inset, silk-lined welt pockets, the secret of their construction totally concealed within hip tucks on the skirt.